OMT-GX63半導體晶圓檢查工業(yè)顯微鏡
工業(yè)顯微鏡廣泛應用于半導體,電子工業(yè)進行晶體,集成電路的檢驗和科學研究.配備有反射照明,成象和觀察系統(tǒng),偏光裝置.
Industrial microscope is widely used for crystal, integrated circuit (IC) examination and research. It is supplied with reflected illumination, imaging and viewing system, polarized imaging system.
規(guī)格 Specifications
◇ 無限遠光學系統(tǒng),管鏡焦距200mm,
Infinitive Optical System, Tube Lens Focal Length 200mm
◇ 鉸鏈式三目鏡筒,30°傾斜, 瞳距55-75mm,
Compensation Free Trinocular Tube, Inclined at 30°, Interpupillary Distance 55-75mm,.
◇ 高眼點,大視場目鏡WF10X/22
High Point and Wide Field Eyepiece WF10/22
◇ 長工作距離,平場復消色差物鏡2X/0.055, 5X/0.14, 10X/0.28, 20X/0.29, 50X/0.42
Long Working Distance, Plan Apo Objectives 2X/0.055, 5X/0.14, 10X/0.28, 20X/0.29, 50X/0.42
◇ 五孔物鏡轉換器,物鏡螺紋M26x0.706
Quintuple Nosepiece, Objective Screw M26x0.706
◇ 6″雙層活動平臺,移動范圍6"x6"(150mmx150mm),使用范圍230mmx280mm
6″Double Layers Mechanical Stage, Mobile Range 6"x6"
◇ 同軸粗微調焦機構,移動行程40mm,微動格值0.002mm
Coaxial Coarse & Fin Focus Adjustment System, travel range 40mm,fine Division 0.002mm
◇ 12V50W鹵素燈反射照明
12V50W Halogen Lamp Reflected Illumination
